uv light source spectroline enf-260c  (Spectronics corporation)

Journal: Advances in Orthopedics

Article Title: Infection Mitigation Efficacy of Photoactive Titania on Orthopedic Implant Materials

doi: 10.4061/2011/571652

Figure Lengend Snippet: Confocal images of the bacterial colonies at different times in suspension containing Henkel Ti plate (autoclaved in 5 M NaOH at 100°C/2 h) and exposed to a handheld IR laser ( λ = 808 nm) for 30 s.

Article Snippet: Since the majority of bactericidal experiments using titania photocatalyst to date have employed a UV source [ – ], one set of data was created by using a handheld UV light source ( λ = 365 nm; Spectroline, model ENF-260C, Westbury, NY, USA) for ready comparison of the results.

Techniques: Suspension

Journal: Advances in Orthopedics

Article Title: Infection Mitigation Efficacy of Photoactive Titania on Orthopedic Implant Materials

doi: 10.4061/2011/571652

Figure Lengend Snippet: Confocal images of the bacterial colonies at different times in suspension containing Ti plate (Titanium Inc.; anodized for 2 h and chemically etched in EtOH/HF mixture for 5 s) and exposed to a handheld IR laser ( λ = 808 nm) for 24 s.

Article Snippet: Since the majority of bactericidal experiments using titania photocatalyst to date have employed a UV source [ – ], one set of data was created by using a handheld UV light source ( λ = 365 nm; Spectroline, model ENF-260C, Westbury, NY, USA) for ready comparison of the results.

Techniques: Suspension

Journal: Advances in Orthopedics

Article Title: Infection Mitigation Efficacy of Photoactive Titania on Orthopedic Implant Materials

doi: 10.4061/2011/571652

Figure Lengend Snippet: Confocal images of the bacterial colonies at different times in suspension containing Ti wire anodized for 1 h and exposed to a handheld IR laser ( λ = 808 nm) for 12 s.

Article Snippet: Since the majority of bactericidal experiments using titania photocatalyst to date have employed a UV source [ – ], one set of data was created by using a handheld UV light source ( λ = 365 nm; Spectroline, model ENF-260C, Westbury, NY, USA) for ready comparison of the results.

Techniques: Suspension